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http://www.repositorio.ufop.br/jspui/handle/123456789/7349Registro completo de metadados
| Campo Dublin Core | Valor | Idioma |
|---|---|---|
| dc.contributor.author | Manhabosco, Taíse Matte | - |
| dc.contributor.author | Muller, Iduvirges Lourdes | - |
| dc.date.accessioned | 2017-03-10T13:05:25Z | - |
| dc.date.available | 2017-03-10T13:05:25Z | - |
| dc.date.issued | 2009 | - |
| dc.identifier.citation | MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017. | pt_BR |
| dc.identifier.issn | 1573-4803 | - |
| dc.identifier.uri | http://www.repositorio.ufop.br/handle/123456789/7349 | - |
| dc.description.abstract | In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film. | pt_BR |
| dc.language.iso | en_US | pt_BR |
| dc.rights | restrito | pt_BR |
| dc.title | Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. | pt_BR |
| dc.type | Artigo publicado em periodico | pt_BR |
| dc.identifier.uri2 | https://link.springer.com/article/10.1007/s10853-009-3388-9 | pt_BR |
| dc.identifier.doi | https://doi.org/10.1007/s10853-009-3388-9 | - |
| Aparece nas coleções: | DEFIS - Artigos publicados em periódicos | |
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| Arquivo | Descrição | Tamanho | Formato | |
|---|---|---|---|---|
| ARTIGO_DepositionThinCobalt.pdf Restricted Access | 313,38 kB | Adobe PDF | Visualizar/Abrir |
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