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http://www.repositorio.ufop.br/jspui/handle/123456789/7349| Title: | Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. |
| Authors: | Manhabosco, Taíse Matte Muller, Iduvirges Lourdes |
| Issue Date: | 2009 |
| Citation: | MANHABOSCO, T. M.; MÜLLER, I. L. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. Journal of Materials Science, v. 44, n. 1, p. 2931-2937, jun. 2009. Disponível em: <https://link.springer.com/article/10.1007/s10853-009-3388-9>. Acesso em: 10 mar. 2017. |
| Abstract: | In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film. |
| URI: | http://www.repositorio.ufop.br/handle/123456789/7349 |
| metadata.dc.identifier.uri2: | https://link.springer.com/article/10.1007/s10853-009-3388-9 |
| metadata.dc.identifier.doi: | https://doi.org/10.1007/s10853-009-3388-9 |
| ISSN: | 1573-4803 |
| Appears in Collections: | DEFIS - Artigos publicados em periódicos |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| ARTIGO_DepositionThinCobalt.pdf Restricted Access | 313,38 kB | Adobe PDF | View/Open |
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